News
Heidelberg Instruments to support micro optics research at the University of Erlangen Heidelberg, Germany, May 10, 2006: Heidelberg Instruments announced the sale of an advanced DWL400 maskless laser lithography system to the Institute of Optics, Information and Photonics (Max Planck Research Group) at the University of Erlangen-Nuremberg.
The DWL400 system will enable the user to expose minimum structures on photoresist down to 0.6 microns, with an active write area of up to 400 mm by 400 mm.
|