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Spray-on silicon makes its debut Researchers in Japan have unveiled a new way to make silicon-based microelectronic devices. The method involves depositing silicon directly onto a substrate from solution and overcomes some of the problems associated with traditional silicon-processing lithographic techniques, such as using sophisticated clean rooms and expensive vacuum equipment. The researchers say the technique could lead to a way of making large, flexible displays using "ink-jet" technology (Nature 440 783).
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