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Tegal Awarded Key Patent For New Magnetron Sputter Source New sputter source represents break through in target efficiency - provides significant cost savings to chip manufacturersTegal Corporation announced that it has been granted United States Patent, No. 6,783,638 for the Flat Magnetron sputter source. The invention provides for the use of a greater percentage of the material from the sputter target than in existing conventional physical vapor deposition ("PVD") systems. Direct benefits of the novel design include lowering material cost, enhancing sputtering rate, and increasing deposition system availability. System uptime and availability is a key variable in semiconductor chip manufacturers' actual cost of system ownership.
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