News
Cymer partners with IMEC on immersion lithography Cymer, Inc., the world's leading supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, today announced the integration of a Cymer XLA 105 argon fluoride (ArF) light source on a 0.85 numerical aperture (NA) immersion lithography tool at IMEC`s 300 mm wafer fab facility in Leuven, Belgium. The tool integration marks the first milestone in the company`s participation in IMEC`s Industrial Affiliation Program (IIAP) on Advanced Lithography - aimed at accelerating the adoption of immersion lithography process technology for next-generation (45nm and below) semiconductor applications. Acceptance of the tool will be completed later this month.
|