News
ASML Introduces the Industry's Highest NA Immersion Tool for Volume Chip Production at 45 nm Node ASML Holding NV (ASML) today announced a new lithography system with the highest numerical aperture (NA) - 1.2 - in the semiconductor industry. The ASML TWINSCAN XT:1700i system is a 193 nm immersion scanner capable of volume chip production at the 45 nm node. The new system has a NA that jumped from 0.93 to 1.2, skipping the perceived, pre-immersion barrier of 1.0. The first shipment to a customer, a leading semiconductor manufacturer ordering its second ASML immersion system, will take place in Q1 2006.
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