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Aviza, Air Liquide to Develop Advanced Films for Sub-90-nm Manufacturing Aviza Technology, Inc., a leading supplier of production-proven thermal process systems and an industry innovator in atomic layer deposition (ALD), today announced the signing of a joint development agreement (JDA) between Aviza Technology and Air Liquide, the international gas leader. This JDA follows on the heels of the recent collaboration that lead to the development of Aviza`s low temperature chemical vapor deposition process (LPCVD) for silicon nitride (SiN) - dubbed Satin. Under this JDA, Aviza and Air Liquide will leverage their expertise as leaders in semiconductor equipment manufacturing and chemicals formulation, respectively, to improve precursor materials used for advanced single wafer and batch deposition processes for dielectric and electrode applications.
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